Mix-and-Match: E-beam and Optical Lithography for Optical Gratings and Waveguides
نویسنده
چکیده
This report outlines mix-and-match of JEOL e-beam lithography and ASML stepper optical lithography. Optical gratings and waveguides are made using both machines. Systematic overlay testing is also conducted for both machines, which shows overlay offsets ranging from 400nm without process correction to 100nm with process correction per exposure.
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تاریخ انتشار 2011